Chemical mechanical cleaning for post-CMP applications: Defects and metals results

Materials Research Society Symposium - Proceedings

Volumn 477, Issue , 1997, Pages 137-142

  Zhao, E Y ^a   Emami, R ^a   Malik, I ^a   Mishra, K ^a   Krusell, W C ^a   de Larios, J ^a   Hymes, D J ^a  

^a OnTrak Systems Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHEMICAL CLEANING; CHEMICAL POLISHING; CRYSTAL DEFECTS; CRYSTAL IMPURITIES; OXIDES; PARTICLES (PARTICULATE MATTER); SLURRIES; TUNGSTEN;

CHEMICAL MECHANICAL CLEANING; CHEMICAL MECHANICAL POLISHING; DOUBLE SIDED BRUSH SCRUBBING;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0030715181     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (7)