Post-deposition annealing and hydrogenation of hot-wire amorphous and microcrystalline silicon films

Materials Research Society Symposium - Proceedings

Volumn 452, Issue , 1997, Pages 779-784

  Conde, J P ^a   Brogueira, P ^a   Chu, V ^a  

^a INSTITUTO SUPERIOR TÉCNICO   (Portugal)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; AMORPHOUS SILICON; ANNEALING; CHEMICAL VAPOR DEPOSITION; CRYSTALLINE MATERIALS; ELECTRON CYCLOTRON RESONANCE; HYDROGEN; HYDROGENATION; LOW TEMPERATURE EFFECTS; PLASMAS; TRANSPORT PROPERTIES;

HOT WIRE CHEMICAL VAPOR DEPOSITION; HYDROGEN PLASMA; MICROCRYSTALLINE SILICON; MICROCRYSTALLINE SILICON FILMS;

SILICON;

EID: 0030714884     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (13)