Influence of hydrogen addition on the chemical properties of hydrogenated aluminum nitride films prepared by rf reactive sputtering

Materials Research Society Symposium - Proceedings

Volumn 449, Issue , 1997, Pages 999-1004

  Lee, J Y ^a   Yong, Y J ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

BINDING ENERGY; HYDROGEN; HYDROGEN BONDS; HYDROGENATION; MAGNETRON SPUTTERING; RUTHERFORD BACKSCATTERING SPECTROSCOPY; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

HYDROGEN PARTIAL PRESSURE; RF REACTIVE MAGNETRON SPUTTERING;

SEMICONDUCTING ALUMINUM COMPOUNDS;

EID: 0030713470     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (11)