Characterization of wafer charging in ECR etching

International Symposium on Plasma Process-Induced Damage, P2ID, Proceedings

Volumn , Issue , 1997, Pages 119-122

  Lukaszek, Wes ^a  

^a Wafer Charging Monitors Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHARACTERIZATION; CHARGE CARRIERS; CURRENT DENSITY; ELECTRODES; ELECTRON CYCLOTRON RESONANCE; SENSORS; SILICON WAFERS;

CHARGING MONITORS; CHARM POTENTIAL SENSORS; WAFER CHARGING;

PLASMA ETCHING;

EID: 0030712558     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (3)