`Back end' chemical cleaning in integrated circuit fabrication: A tutorial

Materials Research Society Symposium - Proceedings

Volumn 477, Issue , 1997, Pages 145-157

  Obeng, Yaw S ^a   Raghavan, R S ^a  

^a NOKIA RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALKALI METAL COMPOUNDS; COMPOSITION EFFECTS; DIELECTRIC FILMS; INTEGRATED CIRCUIT MANUFACTURE; MOS DEVICES; ORGANIC SOLVENTS; PHOTORESISTS; STRIPPING (REMOVAL);

BARRIER FILMS; RADIOTRACING; WET CHEMICAL CLEANING;

CHEMICAL CLEANING;

EID: 0030711798     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (20)