On the oxide thickness extraction in deep-submicron technologies

IEEE International Conference on Microelectronic Test Structures

Volumn , Issue , 1997, Pages 105-110

  Vincent, E ^a   Ghibaudo, G ^a   Morin, G ^a   Papadas, C ^a  

^a STMICROELECTRONICS   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

CURRENT VOLTAGE CHARACTERISTICS; ELECTRIC VARIABLES MEASUREMENT; INTEGRATED CIRCUIT TESTING;

DEEP SUBMICRON TECHNOLOGIES; OXIDE THICKNESS EXTRACTION METHODS;

ULTRATHIN FILMS;

EID: 0030709119     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (6)