Role of atomic hydrogen for substrate cleaning for growth of CdTe buffer layers at reduced temperatures on silicon, CdTe, and HgCdTe

Materials Research Society Symposium - Proceedings

Volumn 450, Issue , 1997, Pages 263-268

  Hirsch, L S ^a   Yu, Zhonghai ^a   Richards Babb, M R ^a   Myers, T H ^a  

^a WEST VIRGINIA UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; ETCHING; HYDROGEN; MERCURY COMPOUNDS; MOLECULAR BEAM EPITAXY; POLYCRYSTALLINE MATERIALS; SEMICONDUCTING SILICON; SEMICONDUCTOR GROWTH; SINGLE CRYSTALS; SUBSTRATES; SURFACE CLEANING;

ATOMIC HYDROGEN; CADMIUM TELLURIDE (CDTE) SUBSTRATES; EX SITU HYDROFLUORIC ETCHING;

SEMICONDUCTING CADMIUM COMPOUNDS;

EID: 0030708169     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (16)