|
|
Volumn 42, Issue 20-22, 1997, Pages 2981-3414
|
|
Proceedings of the 1996 International Symposium on Electrochemical Microsystem Technologies
[No Author Info available]
|
|
Author keywords
[No Author keywords available]
|
|
Indexed keywords
CYCLIC VOLTAMMETRY;
ELECTROCHEMICAL ELECTRODES;
ELECTRODEPOSITION;
ELECTROLESS PLATING;
ELECTRON BEAM LITHOGRAPHY;
MAGNETIC THIN FILMS;
MICROELECTRODES;
MICROELECTRONICS;
MICROMACHINING;
PLASTIC FILMS;
POTENTIOMETRIC SENSORS;
STERILIZATION (CLEANING);
CHRONOAMPEROMETRY;
EIREV;
ELECTROCHEMICAL MICROMACHINING;
ELECTROCHEMICAL STERILIZATION;
HOFMEISTER ELECTRODES;
MICROELECTROCHEMISTRY;
RAPID MICROPATTERNING;
SCANNING DIFFUSION LIMITED CURRENT PROBE (SLCP);
SCANNING ELECTROCHEMICAL MICROSCOPY (SECM);
ULTRAMICROELECTRODES;
ELECTROCHEMISTRY;
|
|
EID: 0030707388
PISSN: 00134686
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1016/S0013-4686(97)00145-X Document Type: Conference Review |
|
Times cited : (2)
|
|
References (0)
|