Photo-assisted anodic etching of gallium nitride grown by MOCVD

Materials Research Society Symposium - Proceedings

Volumn 449, Issue , 1997, Pages 1035-1040

  Lu, H ^a   Wu, Z ^a   Bhat, I ^a  

^a RENSSELAER POLYTECHNIC INSTITUTE   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CARBOXYLIC ACIDS; CURRENT DENSITY; ELECTROLYSIS; GLYCOLS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; PH; SEMICONDUCTING GALLIUM COMPOUNDS; SURFACE ROUGHNESS;

ETCH RATE; ETHYLENE GLYCOL; NITRIDE SEMICONDUCTORS; PHOTOASSISTED ANODIC ETCHING; TARTARIC ACID;

ETCHING;

EID: 0030706442     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (14)