Role of HO2- in SC-1 cleaning solutions

Materials Research Society Symposium - Proceedings

Volumn 477, Issue , 1997, Pages 47-56

  Verhaverbeke, Steven ^a   Parker, Jennifer W ^a   McConnell, Chris F ^a  

^a CFM Technologies   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHARGE TRANSFER; ETCHING; HYDROGEN PEROXIDE; INTERFACES (MATERIALS); MATHEMATICAL MODELS; PARTICLES (PARTICULATE MATTER); SEMICONDUCTOR GROWTH; SILICON WAFERS; SOLUTIONS; SURFACE CLEANING;

FIRST ORDER REACTION; TRANSPORT LIMITED REACTION;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0030705648     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (14)