Fluorinated amorphous carbon thin films grown from C4F8 for multilevel interconnections of integrated circuits

Materials Research Society Symposium - Proceedings

Volumn 443, Issue , 1997, Pages 165-170

  Endo, Kazuhiko ^a   Tatsumi, Toru ^a   Matsubara, Yoshihisa ^a   Horiuchi, Tadahiko ^a  

^a NEC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; CHEMICAL VAPOR DEPOSITION; FILM GROWTH; FLUOROCARBONS; HELICONS; INTEGRATED CIRCUITS; PERMITTIVITY; PLASMA APPLICATIONS; SILICA; SUBSTRATES; THERMODYNAMIC STABILITY; THIN FILMS;

MULTILEVEL INTERCONNECTIONS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION (PECVD);

DIELECTRIC FILMS;

EID: 0030705443     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (10)