Visible photoluminescence from Si ion-implanted and thermally annealed SiO2 films

Materials Research Society Symposium - Proceedings

Volumn 452, Issue , 1997, Pages 99-104

  Kanemitsu, Y ^a   Shimizu, N ^a   Okamoto, S ^a   Komoda, T ^a   Hemment, P L F ^a   Sealy, B J ^a  

^a UNIVERSITY OF TSUKUBA   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CHEMICAL BONDS; EXCITONS; FABRICATION; FUSED SILICA; GASES; OXYGEN; PHOTOLUMINESCENCE; SEMICONDUCTING SILICON;

SEMICONDUCTOR NANOCRYSTALS; THERMAL ANNEALING TECHNIQUES;

ION IMPLANTATION;

EID: 0030705115     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (20)