Substrate-surface effect on initial growth process of microcrystalline silicon films

Materials Research Society Symposium - Proceedings

Volumn 452, Issue , 1997, Pages 743-748

  Ikuta, K ^a   Park, J W ^a   Kuo, L H ^a   Yasuda, T ^a   Yamasaki, S ^a   Tanaka, K ^a  

^a NATL INST FOR ADV INTERDISC RES   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CRYSTALLINE MATERIALS; EPITAXIAL GROWTH; FILM GROWTH; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; SCANNING TUNNELING MICROSCOPY; SUBSTRATES; SURFACES; TRANSMISSION ELECTRON MICROSCOPY; ULTRATHIN FILMS;

MICROCRYSTALLINE SILICON FILMS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

SILICON;

EID: 0030704165     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (21)