Enlarged parameter space by use of VHF-GD for deposition of thin 〈p〉 type μc-Si:H films

Materials Research Society Symposium - Proceedings

Volumn 452, Issue , 1997, Pages 767-772

  Torres, P ^a   Meier, J ^a   Fluckiger, R ^a   Keppner, H ^a   Shah, A ^a  

^a UNIVERSITY OF NEUCHÂTEL   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLINE MATERIALS; DEPOSITION; ELECTRIC CONDUCTIVITY; GLOW DISCHARGES; LOW TEMPERATURE OPERATIONS; OPTICAL FILMS; PLASMAS; SEMICONDUCTING SILICON;

PLASMA EXCITATION FREQUENCY; VERY HIGH FREQUENCY GLOW DISCHARGE TECHNIQUE;

THIN FILMS;

EID: 0030704164     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (14)