X-ray photoelectron spectroscopy investigation of the interaction of NF3 with silicon

Materials Research Society Symposium - Proceedings

Volumn 439, Issue , 1997, Pages 251-256

  Little, T W ^a   Ohuchi, F S ^a  

^a UNIVERSITY OF WASHINGTON   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL BONDS; ETCHING; ION BEAMS; ION BOMBARDMENT; NITRIDING; PLASMA APPLICATIONS; SEMICONDUCTOR PLASMAS; X RAY PHOTOELECTRON SPECTROSCOPY;

PLASMA PROCESSING APPROXIMATION;

NITROGEN COMPOUNDS;

EID: 0030704144     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (17)