Native oxide and the residual stress of thin Mo and Ta films

Materials Research Society Symposium - Proceedings

Volumn 441, Issue , 1997, Pages 385-390

  Parfitt, L J ^a   Rek, Z U ^a   Yalisove, S M ^a   Bilello, J C ^a  

^a UNIVERSITY OF MICHIGAN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL IMPURITIES; GRAIN GROWTH; INTERFACES (MATERIALS); MAGNETRON SPUTTERING; MOLYBDENUM; OXIDES; PHASE TRANSITIONS; RESIDUAL STRESSES; SILICON WAFERS; STRESS RELAXATION; TANTALUM; THIN FILMS;

COMPRESSIVE STRESSES; GRAZING INCIDENCE X RAY SCATTERING (GIXS);

METALLIC FILMS;

EID: 0030702746     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (11)