Grain-size control of nanocrystalline silicon by pulsed gas plasma process

Materials Research Society Symposium - Proceedings

Volumn 452, Issue , 1997, Pages 749-754

  Itoh, A ^a   Ifuku, T ^a   Otobe, M ^a   Oda, S ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL GROWTH; GRAIN SIZE AND SHAPE; HYDROGEN; NANOSTRUCTURED MATERIALS; NUCLEATION; PLASMAS; SPATIAL VARIABLES CONTROL; TRANSMISSION ELECTRON MICROSCOPY;

GRAIN SIZE CONTROL; NANOCRYSTALLINE SILICON; PULSED GAS PLASMA PROCESS;

SILICON;

EID: 0030699046     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (15)