|
Volumn 248-249, Issue , 1997, Pages 289-292
|
On the amorphization of the Si/Ge superlattices upon ion bombardment
a,b b b c c b b b
c
DAIMLER AG
(Germany)
|
Author keywords
Amorphization; Germanium; Ion Implantation; Silicon; Superlattice
|
Indexed keywords
AMORPHIZATION;
ION BOMBARDMENT;
ION IMPLANTATION;
RUTHERFORD BACKSCATTERING SPECTROSCOPY;
SEMICONDUCTING GERMANIUM;
SEMICONDUCTOR SUPERLATTICES;
TRANSMISSION ELECTRON MICROSCOPY;
CROSS SECTIONAL TRANSMISSION ELECTRON MICROSCOPY (XTEM);
SEMICONDUCTING SILICON COMPOUNDS;
|
EID: 0030693531
PISSN: 02555476
EISSN: 16629752
Source Type: Book Series
DOI: None Document Type: Article |
Times cited : (6)
|
References (10)
|