Plasma cleaning and nitridation of sapphire substrates for AlxGa1-xN epitaxy as studied by ARXPS and XPD

Materials Research Society Symposium - Proceedings

Volumn 468, Issue , 1997, Pages 193-198

  Seelmann Eggebert, M ^a   Zimmermann, H ^a   Obloh, H ^a   Niebuhr, R ^a   Wachtendorf, B ^a  

^a FRAUNHOFER INSTITUTE FOR APPLIED SOLID STATE PHYSICS IAF   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

METALLORGANIC CHEMICAL VAPOR DEPOSITION; NITRIDES; NITRIDING; PLASMA APPLICATIONS; SAPPHIRE; SEMICONDUCTING ALUMINUM COMPOUNDS; SEMICONDUCTING GALLIUM COMPOUNDS; SPECTROSCOPY; SURFACES;

PLASMA CLEANING;

SUBSTRATES;

EID: 0030692283     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-468-193     Document Type: Conference Paper

References (15)