|
|
|
Volumn 441, Issue , 1997, Pages 735-740
|
|
Thermodynamic analysis of blanket and selective epitaxy of SiC on Si and SiO2 masked Si
a
|
|
Author keywords
[No Author keywords available]
|
|
Indexed keywords
COMPOSITION EFFECTS;
DEPOSITION;
EPITAXIAL GROWTH;
ETCHING;
HYDROCHLORIC ACID;
MASKS;
SEMICONDUCTING SILICON;
SILICA;
SUBSTRATES;
THERMAL EFFECTS;
THERMODYNAMICS;
SELECTIVE EPITAXIAL GROWTH;
SILICON CARBIDE;
|
|
EID: 0030688774
PISSN: 02729172
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper |
|
Times cited : (1)
|
|
References (14)
|
