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Volumn 477, Issue , 1997, Pages 513-518
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Formation of water marks on both hydrophilic and hydrophobic wafers
a a a a |
Author keywords
[No Author keywords available]
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Indexed keywords
COMPOSITION EFFECTS;
DRYING;
NITROGEN;
OXIDATION;
OXYGEN;
PARTICLES (PARTICULATE MATTER);
SUBSTRATES;
WATER;
WETTING;
AUGER ANALYSIS;
WATER MARKS FORMATION;
SILICON WAFERS;
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EID: 0030688560
PISSN: 02729172
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper |
Times cited : (3)
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References (9)
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