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Volumn 441, Issue , 1997, Pages 705-710
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Growth of cubic SiC thin films on silicon from single source precursors by supersonic jet epitaxy
a a a a a a a |
Author keywords
[No Author keywords available]
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Indexed keywords
CRYSTAL ORIENTATION;
DEPOSITION;
EPITAXIAL GROWTH;
FILM GROWTH;
HIGH TEMPERATURE EFFECTS;
ION IMPLANTATION;
SILANES;
SILICON CARBIDE;
SILICON ON INSULATOR TECHNOLOGY;
SUBSTRATES;
TRANSMISSION ELECTRON MICROSCOPY;
X RAY CRYSTALLOGRAPHY;
SEPARATION BY IMPLANTED OXYGEN (SIMOX);
SUPERSONIC JET EPITAXY;
SEMICONDUCTING FILMS;
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EID: 0030687114
PISSN: 02729172
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper |
Times cited : (4)
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References (19)
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