Comparison of techniques for gate oxide damage measurements

International Symposium on Plasma Process-Induced Damage, P2ID, Proceedings

Volumn , Issue , 1997, Pages 193-196

  Educato, James L ^a   Gabriel, Calvin T ^a  

^a PHILIPS RESEARCH LABORATORIES   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CORRELATION METHODS; ELECTRIC BREAKDOWN OF SOLIDS; ELECTRIC CURRENT MEASUREMENT; GATES (TRANSISTOR); LEAKAGE CURRENTS; OXIDES; PLASMA ETCHING; VOLTAGE MEASUREMENT;

FOWLER NORDHEIM STRESSES; GATE OXIDE DAMAGE MEASUREMENTS;

MOS DEVICES;

EID: 0030685953     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (5)