Intrinsic and thermal stress in gallium nitride epitaxial films

Materials Research Society Symposium - Proceedings

Volumn 449, Issue , 1997, Pages 775-780

  Ager, J W ^a   Suski, T ^a   Ruvimov, S ^a   Kruger, J ^a   Conti, G ^a   Weber, E R ^a   Bremser, M D ^a   Davis, R ^a   Kuo, C P ^a  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

PHONONS; PHOTOLUMINESCENCE; RAMAN SPECTROSCOPY; SEMICONDUCTING GALLIUM COMPOUNDS; SEMICONDUCTOR GROWTH; STRAIN; THERMAL STRESS; X RAY DIFFRACTION ANALYSIS;

COMPRESSIVE STRAIN; EPITAXIAL FILMS; FILM STRAIN; LOW TEMPERATURE PHOTOLUMINESCENCE;

THIN FILMS;

EID: 0030685558     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (15)