Investigation of diblock copolymer thin film morphology for nanolithography

Materials Research Society Symposium - Proceedings

Volumn 461, Issue , 1997, Pages 179-184

  Park, Miri ^a   Harrison, Christopher ^a   Chaikin, Paul M ^a   Register, Richard A ^a   Adamson, Douglas ^a   Yao, Nan ^a  

^a PRINCETON UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

INTERFACES (MATERIALS); LITHOGRAPHY; MORPHOLOGY; NANOTECHNOLOGY; PHASE SEPARATION; POLYBUTADIENES; POLYSTYRENES; REACTIVE ION ETCHING; SEMICONDUCTING SILICON; SILICON NITRIDE; SYNTHESIS (CHEMICAL); THIN FILMS;

CHAIN MOBILITY; MICRODOMAIN; MICROPHASE SEPARATION; ORDERING; SPIN COATING; WETTING CONSTRAINTS;

BLOCK COPOLYMERS;

EID: 0030685421     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (22)