Formation of compositionally graded Ni-P deposits containing SiC particles by jet electroplating

Materials Transactions, JIM

Volumn 38, Issue 1, 1997, Pages 43-48

  Takeuchi, Hiromitsu ^a   Tsunekawa, Yoshiki ^a   Okumiya, Masahiro ^a  

^a TOYOTA TECHNOLOGICAL INSTITUTE   (Japan)

Author keywords

Composite coating; Compositional gradient; Deposition rate; Electrolyte jet; Electroplating; Limiting current density; Nickel phosphorus matrix; SiC particle

Indexed keywords

CATHODES; COATINGS; COMPOSITION; CURRENT DENSITY; DEPOSITION; ELECTROLYTES; NICKEL COMPOUNDS; PHOSPHORUS; SILICON CARBIDE; VOLUME FRACTION;

COMPOSITE COATING; COMPOSITIONAL GRADIENT; DEPOSITION RATE; ELECTROLYTE JET; LIMITING CURRENT DENSITY; NICKEL PHOSPHORUS MATRIX;

ELECTROPLATING;

EID: 0030684997     PISSN: 09161821     EISSN: None     Source Type: Journal    
DOI: 10.2320/matertrans1989.38.43     Document Type: Article

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