High upconversion intensity of Er3+ in a LaF3 thin film on CaF2 (111) grown by the molecular beam epitaxy method

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 36, Issue 1 PART A/B, 1997, Pages

  Uda, Satoshi ^a,b   Adachi, Kazunori ^a,b   Inaba, Katsuhiko ^a   Yao, Takafumi ^a   Kasuya, Atsuo ^a   Fukuda, Tsuguo ^a  

^a TOHOKU UNIVERSITY   (Japan)

^b MITSUBISHI MATERIALS CORPORATION   (Japan)

Author keywords

538 nm Emission; Concentration quenching; Energy transfer; Epitaxial growth; Er3+ concentration; Excited state absorption; Lanthanum fluoride; Molecular beam epitaxy; Stark splitting; Upconversion

Indexed keywords

CRYSTAL STRUCTURE; ENERGY TRANSFER; LANTHANUM COMPOUNDS; LIGHT EMISSION; MOLECULAR BEAM EPITAXY; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; SUBSTRATES; THIN FILMS;

CALCIUM FLUORIDE; HIGH UPCONVERSION INTENSITY; LANTHANUM FLUORIDE;

ERBIUM;

EID: 0030684968     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.36.l41     Document Type: Article

References (16)

1. S. A. Pollack and D. B. Chang: J. Appl. Phys. 64 (1988) 2885.
2. M. Lui, R. A. McFarlane, D. Yap and D. Lederman: Electron. Lett. 29 (1993) 172.
3. E. Daran, L. E. Bausá, A. Muñoz-Yagüe and C. Fontaine: Appl. Phys. Lett. 62 (1993) 2616.
4. E. Daran, L. E. Bausá, R. Legros, C. Fontaine and J. G. Solé: Solid State Commun. 94 (1995) 379.
5. A. Brenier, A. M. Jurdyc, H. Verweij, M. T. Cohen-Adad and G. Boulon: Opt. Mater. 5 (1996) 233.
6. L. E. Bausá, G. Lifante, E. Daran and P. L. Pernas: Appl. Phys. Lett. 68 (1996) 3242.
7. K. Adachi, T. Yao, T. Taniuchi, A. Kasuya, R. H. Miles, S. Uda and T. Fukuda: Jpn. J. Appl. Phys. 35 (1996) L435.
8. C. Buchal, T. Siegrist, D. C. Jacobson and J. M. Poate: Appl. Phys. Lett. 68 (1996) 438.
9. D. K. Fork, F. Armani-Leplingard, M. Lui and R. A. McFarlane: J. Lightwave Technol. 14 (1996) 611.
10. J. P. V. d. Ziel, J. F. W. Ostermayer and L. G. V. Uitert: Phys. Rev. B 2 (1970) 4432.
11. B. R. Reddy and P. Venkateswarlu: Appl. Phys. Lett. 64 (1994) 1327.
12. T. J. Whitley, C. A. Millar, R. Wyatt, M. C. Brierley and D. Szebesta: Electron. Lett. 27 (1991) 1785.
13. F. Heine, E. Heumann, T. Danger, T. Schweizer, G. Huber and B. H. T. Chai: Appl. Phys. Lett. 65 (1994) 383.
14. M. Pollnau, W. Luthy and H. P. Weber: J. Appl. Phys. 77 (1995) 6128.
15. W. F. Krupke and J. B. Gruber: J. Chem. Phys. 39 (1963) 1024.
16. W. F. Krupke and J. B. Gruber: J. Chem. Phys. 41 (1964) 1225.