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Volumn 170, Issue 1-4, 1997, Pages 335-339
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Growth of GaN/AlN and AlGaN by MOCVD using triethylgallium and tritertiarybutylaluminium
a a a a a a |
Author keywords
[No Author keywords available]
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Indexed keywords
NITRIDES;
OPTICAL PROPERTIES;
PHOTOCONDUCTIVITY;
PHOTOLUMINESCENCE;
SEMICONDUCTING ALUMINUM COMPOUNDS;
SEMICONDUCTING GALLIUM COMPOUNDS;
SEMICONDUCTOR GROWTH;
X RAY DIFFRACTION ANALYSIS;
ALUMINUM NITRIDE;
GALLIUM NITRIDE;
PHOTOTHERMAL DEFLECTION;
SPECTRALLY RESOLVED PHOTOCONDUCTIVITY;
METALLORGANIC CHEMICAL VAPOR DEPOSITION;
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EID: 0030681919
PISSN: 00220248
EISSN: None
Source Type: Journal
DOI: 10.1016/S0022-0248(96)00623-9 Document Type: Article |
Times cited : (21)
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References (22)
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