Fluorination of carbon blacks: An x-ray photoelectron spectroscopy study: III. Fluorination of different carbon blacks with gaseous fluorine at temperatures below 100°C influence of the morphology, structure and physico-chemical characteristics of the carbon black on the fluorine fixation

Carbon

Volumn 35, Issue 4, 1997, Pages 515-528

  Nanse G ^a   Papirer, E ^a   Fioux, P ^a   Moguet, F ^b   Tressaud, A ^b  

^a INSTITUT DE CHIMIE DES SURFACES ET INTERFACES   (France)

^b INST CHIM MATIERE COND BORDEAUX   (France)

Author keywords

A. Carbon black; Activation; B. halogenation; C. photoelectron spectroscopy; D. reactivity

Indexed keywords

CHEMICAL ACTIVATION; CHEMICAL BONDS; CRYSTAL STRUCTURE; DENSITY (SPECIFIC GRAVITY); FLUORINE; HALOGENATION; MORPHOLOGY; NITROGEN; POROSITY; SURFACES; X RAY PHOTOELECTRON SPECTROSCOPY;

COVALENT BONDS; FLUORINATION; FLUORINE FIXATION;

CARBON BLACK;

EID: 0030681170     PISSN: 00086223     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0008-6223(97)00003-1     Document Type: Article

References (7)

1. Papirer, E., Tressaud, A., Moguet, F., Nansé, G. and Fioux, Ph., Fluorination of Carbon Black. An X-ray Photoelectron Spectroscopy Study, Part II: XPS Study of a Furnace Carbon Black Treated With Gaseous Fluorine at Temperatures Below 100°C. Influence of the Reaction Parameters and of the Activation of the Starting Material on the Fluorine Fixation, Carbon, 1977, 35, 371.
2. Laine, N. R., Vastola, F. J. and Walker Jr, P. L., J. Phys. Chem., 1963, 67, 2030.
3. Papirer, E., Tressaud. A., Moguet, F., Nansé, G. and Fioux, Ph., Fluorination of Carbon Black. An X-ray Photoelectron Spectroscopy Study, Part I: A Literature Review of XPS Studies of Fluorinated Carbons. XPS Investigations of Some Reference Compounds, Carbon, 1997, 35, 175.
4. Papirer, E., Lacroix, R., Donnet, J. B., Nansé, G. and Fioux, Ph., Carbon, 1994, 32(7), 1341.
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6. Papirer, E., Lacroix, R., Donnet, J. B., Nansé, G. and Fioux, Ph., Carbon, 1995, 33(1), 63.
7. Hess, W. M. and Herd, Ch. R., in Carbon Black Science and Technology, 2nd edn. ed. J. B. Donnet, R. C. Bansal and M. J. Wang. Marcel Dekker, New York, 1993. pp. 124-142.