Crystallization of Si(1-y)Cy films by excimer laser annealing: characterization of the microstructure of the films

Materials Research Society Symposium - Proceedings

Volumn 452, Issue , 1997, Pages 959-964

  Boher, P ^a   Stehle, M ^a   Stehle, J L ^a   Fogarassy, E ^a   Grob, J J ^a   Grob, A ^a   Muller, D ^a  

^a SOPRA   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CHARACTERIZATION; CRYSTAL DEFECTS; CRYSTAL MICROSTRUCTURE; ELLIPSOMETRY; EXCIMER LASERS; ION IMPLANTATION; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SEMICONDUCTING FILMS; SILICON WAFERS; X RAY CRYSTALLOGRAPHY;

EXCIMER LASER ANNEALING; MONOCRYSTALLINE SILICON; SPECTROSCOPIC ELLIPSOMETRY;

CRYSTALLIZATION;

EID: 0030678646     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (10)