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Volumn , Issue , 1997, Pages 460-464
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Fabrication of multiple-level electrically isolated high-aspect-ratio single crystal silicon microstructures
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Author keywords
[No Author keywords available]
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Indexed keywords
ASPECT RATIO;
CRYSTAL MICROSTRUCTURE;
ELECTRON GUNS;
ELECTROSTATIC LENSES;
LITHOGRAPHY;
METALLIZING;
MICROMACHINING;
SEMICONDUCTING SILICON;
SEMICONDUCTOR DEVICE MANUFACTURE;
SINGLE CRYSTALS;
SURFACE ROUGHNESS;
ELECTROSTATIC MICROLENSES;
MICROELECTROMECHANICAL DEVICES;
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EID: 0030676703
PISSN: None
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper |
Times cited : (6)
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References (8)
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