Performance evaluation of CMOS ring-oscillators with source/drain regions fabricated by asymmetric/symmetric ion-implantation

IEEE International Conference on Microelectronic Test Structures

Volumn , Issue , 1997, Pages 131-136

  Ohzone, Takashi ^a   Miyakawa, Tetsu ^a   Matsuda, Toshihiro ^a   Yabu, Toshiki ^a   Odanaka, Shinji ^a  

^a TOYAMA PREFECTURAL UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CMOS INTEGRATED CIRCUITS; INTEGRATED CIRCUIT LAYOUT; INTEGRATED CIRCUIT TESTING; ION IMPLANTATION; MOSFET DEVICES;

RING OSCILLATORS;

SOLID STATE OSCILLATORS;

EID: 0030676637     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (11)