Single crystal silicon micromachined pulsed infrared light source

International Conference on Solid-State Sensors and Actuators, Proceedings

Volumn 2, Issue , 1997, Pages 1271-1274

  Yuasa, Hiroyasu ^a   Ohya, Seishiro ^a   Karasawa, Shiro ^a   Akimoto, Kenji ^a   Kodato, Setsuo ^a   Takahashi, Kiyoshi ^a  

^a Port and Airport Research Institute   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ETCHING; ION IMPLANTATION; MICROMACHINING; PERFORMANCE; SEMICONDUCTING SILICON; SEMICONDUCTOR DEVICE STRUCTURES; SINGLE CRYSTALS; TEMPERATURE CONTROL; TEMPERATURE MEASUREMENT; THERMODYNAMICS;

ANISOTROPIC ETCHING; MICROBRIDGE SIZE; PULSED ELECTRIC SIGNAL; THERMAL TIME CONSTANT; TRANSIENT TEMPERATURE DISTRIBUTION;

LIGHT SOURCES;

EID: 0030675950     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (14)