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Materials Science Forum

Volumn 248-249, Issue , 1997, Pages 357-360

Evaluation of coatings produced by low-energy ion assisted deposition of Co on silicon

(3) Tashlykov, I S a Carter, G b Colligon, J S b

a BELARUSIAN STATE TECHNOLOGICAL UNIVERSITY (Belarus)

b UNIVERSITY OF SALFORD (United Kingdom)

Author keywords

Atom Mixing; Cobalt; Ion Assisted Deposition; Sputtering

Indexed keywords

COBALT; DEPOSITION; FILM GROWTH; INTERFACES (MATERIALS); ION BEAMS; ION BOMBARDMENT; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SEMICONDUCTING SILICON; SURFACE TREATMENT;

ION ASSISTED DEPOSITION; ION TO ATOM RATIO;

METALLIC FILMS;

EID: 0030675481 PISSN: 02555476 EISSN: 16629752 Source Type: Book Series
DOI: 10.4028/www.scientific.net/msf.248-249.357 Document Type: Review

Times cited : (1)

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