Microstructural observation of focused ion beam modification of Ni silicide/Si thin films

Materials Research Society Symposium - Proceedings

Volumn 439, Issue , 1997, Pages 227-232

  Tanaka, Miyoko ^a   Furuya, Kazuo ^a   Saito, Tetsuya ^a  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ELECTROMAGNETIC WAVE DIFFRACTION; HIGH TEMPERATURE EFFECTS; ION BEAMS; ION BOMBARDMENT; NICKEL COMPOUNDS; SILICON COMPOUNDS; SPUTTERING; SUBSTRATES; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X RAY SPECTROSCOPY;

ENERGY DISPERSIVE X RAY SPECTROSCOPY (EDS); FOCUSED ION BEAM (FIB) IRRADIATION; SELECTIVE AREA DIFFRACTION (SAD) PATTERNS; SILICIDES;

METALLIC FILMS;

EID: 0030674865     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (19)