Stabilization of hydrogen-free CVD-SiO2 films

Materials Research Society Symposium - Proceedings

Volumn 446, Issue , 1997, Pages 21-26

  Uchida, Y ^a   Takei, S ^a   Matsumura, M ^a  

^a TEIKYO UNIVERSITY OF SCIENCE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMINES; ANNEALING; BINARY MIXTURES; CHEMICAL BONDS; CHEMICAL VAPOR DEPOSITION; HYDROFLUORIC ACID; OZONE; SILANES; SILICA; THERMAL EFFECTS;

TERTIARY ALKYL AMINES; TETRAISOCYANATE SILANES; WATER RESISTANCE;

THIN FILMS;

EID: 0030674174     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (7)