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Volumn , Issue 136 PART 3, 1997, Pages 1580-1583
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The oxidation kinetics of a yttria-doped hot-pressed silicon nitride
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Author keywords
Kinetics; Modelling; Oxidation; Silicon nitride; Thermogravimetry
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Indexed keywords
CERAMIC MATERIALS;
DIFFUSION;
NITROGEN;
OXIDATION;
OXIDATION RESISTANCE;
REACTION KINETICS;
SILICA;
THERMOGRAVIMETRIC ANALYSIS;
YTTRIUM COMPOUNDS;
YTTRIA;
SILICON NITRIDE;
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EID: 0030672872
PISSN: 10139826
EISSN: 16629795
Source Type: Book Series
DOI: None Document Type: Article |
Times cited : (4)
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References (7)
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