New process for combining anisotropic bulk etching with subsequent precision lithography

International Conference on Solid-State Sensors and Actuators, Proceedings

Volumn 1, Issue , 1997, Pages 679-682

  Vieider, Christian ^a   Holm, Johan ^a   Forssen, Lili ^a   Elderstig, Hakan ^a   Lindgren, Stefan ^a   Ahlfeldt, Henrik ^a  

^a ACREO AB   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ETCHING; LITHOGRAPHY; MICROELECTRONIC PROCESSING; POTASSIUM COMPOUNDS; SILICON NITRIDE; SILICON WAFERS; ULTRASONIC APPLICATIONS;

LASER CHIP CARRIERS; ULTRASONIC ETCHING;

MICROELECTROMECHANICAL DEVICES;

EID: 0030659886     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (5)