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Volumn 441, Issue , 1997, Pages 75-80
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Effect of non-hydrostatic stress on kinetics and interfacial roughness during solid phase epitaxial growth in Si
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Author keywords
[No Author keywords available]
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Indexed keywords
LIGHT REFLECTION;
OPTICAL VARIABLES MEASUREMENT;
PHASE INTERFACES;
SEMICONDUCTING SILICON;
STRESS ANALYSIS;
SURFACE ROUGHNESS;
TRANSMISSION ELECTRON MICROSCOPY;
NONHYDROSTATIC STRESS;
REFLECTIVITY MEASUREMENT;
SOLID PHASE EPITAXY;
EPITAXIAL GROWTH;
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EID: 0030658312
PISSN: 02729172
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper |
Times cited : (8)
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References (12)
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