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Volumn 1, Issue , 1997, Pages 251-254
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D-LDD (Double Lightly-Doped Drain) structure H-MESFET for MMIC applications
a a a a a a
a
NTT CORPORATION
(Japan)
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Author keywords
[No Author keywords available]
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Indexed keywords
AMPLIFIERS (ELECTRONIC);
ELECTRIC BREAKDOWN OF SOLIDS;
GATES (TRANSISTOR);
HETEROJUNCTIONS;
JUNCTION GATE FIELD EFFECT TRANSISTORS;
MONOLITHIC MICROWAVE INTEGRATED CIRCUITS;
SEMICONDUCTING GALLIUM ARSENIDE;
SEMICONDUCTING INDIUM PHOSPHIDE;
DOUBLE LIGHTLY DOPED DRAIN (DLDD) STRUCTURES;
MESFET DEVICES;
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EID: 0030655710
PISSN: 0149645X
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper |
Times cited : (4)
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References (8)
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