Hydrodynamic description of epitaxial film growth in a horizontal reactor

Journal of Crystal Growth

Volumn 170, Issue 1-4, 1997, Pages 61-65

  Mizuno, Yoshichika ^a   Uekusa, Shin Ichiro ^a   Okabe, Hideyuki ^a  

^a MEIJI UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; FILM GROWTH; HYDRODYNAMICS; SEMICONDUCTOR GROWTH;

FILM THICKNESS DISTRIBUTION; VORTICITY DISTRIBUTION;

EPITAXIAL GROWTH;

EID: 0030653987     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0248(96)00566-0     Document Type: Article

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