Cluster ion beam processing

Materials Science Forum

Volumn 246, Issue , 1997, Pages 239-260

  Yamada, I ^a  

^a KYOTO UNIVERSITY   (Japan)

Author keywords

Cluster Ion; Deposition; Implantation; Ion Beam; Sputtering

Indexed keywords

FILM PREPARATION; ION BEAMS; ION IMPLANTATION; SPUTTER DEPOSITION; SURFACE TREATMENT; TECHNOLOGICAL FORECASTING;

CLUSTER ION BEAM PROCESSING; MULTI COLLISION EFFECTS; SURFACE PROCESSING;

COATING TECHNIQUES;

EID: 0030653555     PISSN: 02555476     EISSN: 16629752     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/msf.246.239     Document Type: Article

References (10)

1. I. Yamada, Electronics (Japanese, Ohm Sya Publishing Co.) Dec.(1994) and Jan., Feb., Apr. and Nov. (1995)
2. IIT'96 Extended Abstract
3. I. Yamada, Mat. Res. Soc. Proc. Vol.268, (Materials Research Society, 1992) p.261.
4. J.R. Conrad, J. Radtke, R.A. Dodd, and F.J. Worzala, J.Appl. Phys., 62 4591 (1987)
5. N.W. Cheung, Nuclear Instrument and Methods, B55, 811 (1991)
6. I. Yamada, Proc. 14th Symp. on Ion Sources and Ion-Assisted Technology, Tokyo, 1991 (The Ion Engineering Society of Japan, Tokyo) p.227.
7. Recent reports, I. Yamada and J. Matsuo, 1996 MRS spring Meeting April 19, 1996 San Francisco. in Print. and I. Yamada, J. Matsuo, Z. Insepov, D. Takeuchi, M. Aakizuki and N. Toyoda, J. Vac. Sci. Technol. A. 14 (3) May/Jun 781 (1996)
8. M. Current, Proc. J-MRS. Conf. on Adv. Mat., Makuhari,1996, Adv. Mat. '96, IV /Laser and Ion Beam Modification of Materials, eds. I. Yamada et al. (Elsevier, Amsterdam, 1994) ,and Nucl. Instr. and Methods, B (1996)in Print.
9. AMMTRA Project catalogue
10. ibid. [4]