General dependence of electron shading damage on the wafer bias power

International Symposium on Plasma Process-Induced Damage, P2ID, Proceedings

Volumn , Issue , 1997, Pages 49-51

  Hashimoto, Koichi ^a   Shimpuku, Fumihiko ^a   Hasegawa, Akihiro ^a   Hikosaka, Yukinobu ^a   Nakamura, Moritaka ^a  

^a FUJITSU LABORATORIES LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITORS; ELECTRIC BREAKDOWN OF SOLIDS; MOS DEVICES; PLASMA DENSITY;

ELECTRON SHADING DAMAGE; HIGH DENSITY PLASMA (HDP) ETCH TOOLS; WAFER BIAS POWER;

PLASMA ETCHING;

EID: 0030651883     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (9)