Reduction of electron shading damage with pulse-modulated ECR plasma

International Symposium on Plasma Process-Induced Damage, P2ID, Proceedings

Volumn , Issue , 1997, Pages 55-57

  Sakamori, Shigenori ^a   Maruyama, Takahiro ^a   Fujiwara, Nobuo ^a   Miyatake, Hiroshi ^a   Yoneda, Masahiro ^a  

^a MITSUBISHI ELECTRIC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; CHARGE CARRIERS; DEGRADATION; ELECTRIC BREAKDOWN; ELECTRON CYCLOTRON RESONANCE; OXIDES; PLASMA DENSITY; PLASMAS; PULSE MODULATION; SEMICONDUCTING SILICON; SUBSTRATES; VOLTAGE MEASUREMENT;

ELECTRON SHADING DAMAGE; METAL NITRIDE OXIDE SILICON (MNOS) CAPACITORS;

CAPACITORS;

EID: 0030651736     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (8)