High aspect ratio single crystalline silicon microstructures fabricated with multilayer substrates

International Conference on Solid-State Sensors and Actuators, Proceedings

Volumn 1, Issue , 1997, Pages 633-636

  Gui, C ^a   Jansen, H ^a   de Boer, M ^a   Berenschot, J W ^a   Gardeniers, J G E ^a   Elwenspoek, M ^a  

^a UNIVERSITY OF TWENTE   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; CHEMICAL POLISHING; CHEMICAL VAPOR DEPOSITION; REACTIVE ION ETCHING; SEMICONDUCTING SILICON; SINGLE CRYSTALS; SUBSTRATES;

LOW PRESSURE CHEMICAL VAPOR DEPOSITION (LPCVD); SILICON FUSION BONDING;

CRYSTAL MICROSTRUCTURE;

EID: 0030651443     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (15)