On the link between electron shadowing and charging damage

International Symposium on Plasma Process-Induced Damage, P2ID, Proceedings

Volumn , Issue , 1997, Pages 63-66

  Hwang, Gyeong S ^a   Giapis, Konstantinos P ^a  

^a CALIFORNIA INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; ELECTRON TUNNELING; ELECTRONS; IONS; MASKS; OXIDES; PLASMA SIMULATION; VOLTAGE DISTRIBUTION MEASUREMENT;

ELECTRON SHADOWING; PATTERN DEPENDENT CHARGING; THIN GATE OXIDES;

PLASMA ETCHING;

EID: 0030651197     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (10)