Morphological stability of TiSi2 on polycrystalline silicon

Thin Solid Films

Volumn 293, Issue 1-2, 1997, Pages 34-39

  Chen, J F ^a   Chen, L J ^a  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

Polycrystalline silicon; Resistance; Stability; Titanium

Indexed keywords

AGGLOMERATION; AMORPHOUS SILICON; CRYSTAL MICROSTRUCTURE; ELECTRIC RESISTANCE MEASUREMENT; GRAIN GROWTH; MORPHOLOGY; POLYCRYSTALLINE MATERIALS; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

TITANIUM SILICIDES;

TITANIUM COMPOUNDS;

EID: 0030648399     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(96)09124-9     Document Type: Article

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