Photosensitive benzocyclobutene for stress-buffer and passivation applications (one mask manufacturing process)

Proceedings - Electronic Components and Technology Conference

Volumn , Issue , 1997, Pages 1260-1268

  Strandjord, A J G ^a   Rogers, W B ^a   Ida, Y ^a   De Vellis, R R ^a   Shiau, S ^a   Moyer, E S ^a   Scheck, D M ^a   Garrou, P E ^a  

^a DOW CHEMICAL COMPANY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BUTENES; DIELECTRIC MATERIALS; PASSIVATION; PHOTOSENSITIVITY; POLYMERS; PROTECTIVE COATINGS;

PHOTOSENSITIVE BENZOCYCLOBUTENE; STRESS BUFFER;

ELECTRONICS PACKAGING;

EID: 0030648157     PISSN: 05695503     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (19)