Airborne molecular contamination control of materials utilized in the construction of a semiconductor manufacturing facility

Conference Proceedings - Annual Semiconductor Pure Water and Chemicals Conference

Volumn 2, Issue , 1997, Pages 143-156

  Gutowski, T ^a   Oikawa, H ^a   Kobayashi, S ^a  

^a Industrial Design Corp   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AIR POLLUTION CONTROL; SEMICONDUCTOR DEVICE MANUFACTURE;

AIRBORNE MOLECULAR CONTAMINATION CONTROL;

CLEAN ROOMS;

EID: 0030647877     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (16)