Silicon shadow-masked MOVPE for InP-based thickness-tapered guided-wave devices

Conference Proceedings - International Conference on Indium Phosphide and Related Materials

Volumn , Issue , 1997, Pages 590-593

  Aoki, M ^a   Komori, M ^a   Sato, H ^a   Taike, A ^a   Uomi, K ^a  

^a HITACHI LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

METALLORGANIC VAPOR PHASE EPITAXY; SEMICONDUCTING INDIUM PHOSPHIDE; SEMICONDUCTING SILICON; SEMICONDUCTOR DEVICE STRUCTURES; SEMICONDUCTOR QUANTUM WELLS; WAVEGUIDES;

SILICON SHADOW MASK GROWTH TECHNIQUE;

SEMICONDUCTOR LASERS;

EID: 0030647609     PISSN: 10928669     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (10)